Sputter-cleaned Epitaxial V x Mo (1-x) N y /MgO(001)Thin Films Analyzed by X-ray PhotoelectronSpectroscopy: 3. Polycrystalline V 0.49 Mo 0.51 N 1.02 [Elektronisk resurs]
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Greczynski, Grzegorz 1973- (författare)
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Kindlund, Hanna (författare)
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Petrov, Ivan (författare)
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Greene, Joseph E (författare)
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Hultman, Lars (författare)
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- Linköpings universitet Institutionen för fysik, kemi och biologi (utgivare)
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Alternativt namn: Linköpings universitet. Institutionen för fysik och mätteknik
(tidigare namn)
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Alternativt namn: Linköpings universitet. Institutionen för fysik och mätteknik, biologi och kemi
(tidigare namn)
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Alternativt namn: IFM
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Alternativt namn: Engelska : Department of Physics and Measurement Technology, Biology and Chemistry
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Alternativt namn: Engelska : Department of Physics, Chemistry and Biology
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Linköpings universitet Tekniska fakulteten (utgivare)
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Thin Film Physics (medarbetare)
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Thin Film Physics (medarbetare)
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Thin Film Physics (medarbetare)
- 2013
- Engelska.
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Ingår i: Surface Science Spectra. - 1055-5269. ; 20, 80-85
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- Vx Mo (1-x)Ny thin films grown by ultrahigh vacuum reactive magnetron sputter deposition on MgO(001) substrates are analyzed by x-ray photoelectron spectroscopy (XPS). This contribution presents analytical results for 300-nm-thick 002-textured polycrystalline V0.49 Mo 0.51N1.02 films deposited by reactive cosputtering from V (99.95 % purity) and Mo (99.95 % purity) targets. Film growth is carried out at 500 °C in mixed Ar/N2 atmospheres at a total pressure of 5 mTorr, with a N2 partial pressure of 3.2 mTorr; a bias of −30 V is applied to the substrate. Films composition is determined by Rutherford backscattering spectrometry (RBS). XPS measurements employ monochromatic Al K α radiation (hν = 1486.6 eV) to analyze V0.49 Mo 0.51N1.02 surface sputter-cleaned in-situ with 4 keV Ar + ions incident at an angle of 70° with respect to the surface normal. XPS results show that the ion-etched sample surfaces have no measurable oxygen or carbon contamination; film composition, obtained using XPS sensitivity factors, is V0.34 Mo 0.66N1.00. All core level peaks, including the nearby Mo 3p3/2 (binding energy of 394.3 eV) and N 1s (at 397.4 eV) peaks, are well-resolved. Comparison to V0.33 Mo 0.67N0.64 and V0.34 Mo 0.66N0.81 single-crystal film surfaces, submitted separately to Surface Science Spectra, indicates that with decreasing growth temperature from 900 to 700 and 500 °C (and increasing nitrogen concentration in Vx Mo (1-x)Ny from y = 0.64 to 0.81 and 1.00) the N 1s core level peak shifts from 397.6 eV to 397.5 eV to 397.4 eV while metal atom peaks move towards higher binding energy by 0.2-0.4 eV.
Ämnesord
- Natural Sciences (hsv)
- Physical Sciences (hsv)
- Condensed Matter Physics (hsv)
- Naturvetenskap (hsv)
- Fysik (hsv)
- Den kondenserade materiens fysik (hsv)
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